Electron Beam Evaporation Coating System
Used for precision coating of conductive, optical, and semiconductor films, this system supports research - grade thermal vacuum deposition in laboratory environments.
CMT-450B Advanced Laser Coating System
CMT - 450B laser coating system enables precise deposition of superconducting, semiconductor, and functional thin films. Ideal for research and prototyping.
Pyriform Single - Chamber Magnetron Sputtering Coater
Compact sputtering coater designed for nanoscale monolayer and multilayer thin films. Suitable for academic research and small - scale film fabrication.
CMT-450A High - Energy Laser Coating Equipment
High - energy laser coating system designed for fabricating superconducting, semiconductor, and ferroelectric thin films in R & D and pilot - scale production.
Square Four - Chamber Magnetron Sputtering System
Designed for large - area thin film coatings, this four - chamber magnetron sputtering system enables sequential or reactive metal deposition on crystalline silicon under high or low vacuum.
High-Purity Magnetron Sputtering Coating System
Designed for nano/microstructure thin film fabrication, this magnetron sputtering system supports metal, oxide, nitride, and dielectric film deposition with flexible dual - target modes.
Electron Beam Physical Vapor Deposition (EB - PVD) System
EB - PVD system provides high - efficiency vapor deposition of refractory metals and ceramics using 270º electron beam heating and plasma - assisted surface cleaning.
Compact Magnetron Sputtering System for Thin Films
Compact magnetron sputtering system for nanometer - scale film preparation, suitable for metal, dielectric, and semiconductor coatings in academic and R&D environments.
Laser Molecular Beam Epitaxy (MBE) System
Laser MBE system enables epitaxial growth of complex thin films, including high - melting - point, multi - element, and gas - containing materials, for advanced material R&D.
Thermal Evaporation Vacuum Coating Machine
This thermal evaporation vacuum coater enables metal, oxide, semiconductor, and organic film deposition using resistive heating. Ideal for research and pre - production testing.